Atomic layer deposition system for thin film/shell deposition. Available materials include Al2O3, ZrO2, HfO2, TiO2, SiO2, Ni and NiO.
Atomic layer deposition system for thin film/shell deposition. Available materials include Al2O3, ZrO2, HfO2, TiO2, SiO2, Ni and NiO.
